Plasma-assisted chemical vapor deposition processes and their semiconductor applications |
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Authors: | A. Sherman |
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Affiliation: | Applied Materials Inc., 3050 Bowers Avenue, Santa Clara, CA 95051 U.S.A. |
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Abstract: | When plasmas are used to assist chemical vapor deposition processes little thought is given to the nature of the electrical discharge that creates the plasma or the interaction between the plasma and the chamber. In this paper, some of the phenomena essential to the understanding of plasma behavior are reviewed. At the same time, some new reactor concepts that may offer improvements over traditional production reactors will be discussed. |
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