Annealing effects on the structural, electrical and H2 sensing properties of transparent ZnO thin films, grown by pulsed laser deposition |
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Authors: | M Stamataki I Fasaki D Tsamakis |
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Affiliation: | a School of Electrical Engineering and Computer Science, National Technical University of Athens, 9 Iroon Polytechniou Zografou, 15780 Athens, Greece b Theor. and Phys./Chem. Institute, National Hellenic Research Foundation, 48 Vas. Konstantinou Ave., 11635 Athens, Greece |
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Abstract: | Transparent zinc oxide thin films were grown by reactive pulsed laser deposition on glass substrates. The substrates were kept at 200 °C constant temperature. Post-deposition heat treatment, applied to further promote crystallization and overcome any oxygen deficiency, yielded transparent thin films. Structural investigations carried out by atomic force microscopy (AFM) and X-ray diffraction (XRD), have shown a strong influence of deposition technique parameters and post-annealing on the crystallinity of the zinc oxide films. The gas sensing characteristics of these films were investigated towards different hydrogen concentrations (5000-30,000 ppm) at a selected operating temperature within the 150-230 °C range. |
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Keywords: | Zinc oxide (ZnO) Pulsed laser deposition (PLD) Heat treatment Hall effect Atomic force microscopy (AFM) Structural properties Sensors Hydrogen |
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