Enhanced performance of nanostructured thin film anode through Pt plasma enhanced atomic layer deposition for low temperature solid oxide fuel cells |
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| Affiliation: | 1. Department of Mechanical and Aerospace Engineering, Seoul National University, 1, Gwanak-ro, Gwanak-gu, Seoul 08826, Republic of Korea;2. Department of Mechanical Engineering, Soongsil University, Sangdo-ro 369, Dongjak-gu, Seoul 06978, Republic of Korea;3. Nanoscience for Energy Technology and Sustainability, Department of Mechanical and Process Engineering, Eidgenössische Technische Hochschule (ETH) Zürich, Tannenstrasse 3, CH-8092 Zürich, Switzerland;4. Centre for Nanoscience and Technology, Madanjeet School of Green Energy Technology, Pondicherry University, Puducherry 605 014, India;5. Department of Automotive Engineering, Wonkwang University, 460 Iksan-daero, Iksan, Jeonbuk 54538, Republic of Korea;1. School of Mechanical and Aerospace Engineering, Seoul National University, Gwanak-ro 1, Gwanak-gu, Seoul 151-744, Republic of Korea;2. Graduate School of Convergence Science and Technology, Seoul National University, 864-1 Iui-dong, Yeongtong-gu, Suwon 443-270, Republic of Korea |
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| Abstract: | Thin-film electrode deposited by sputtering has drawn attention due to high surface area and density of reaction sites for low-temperature solid oxide fuel cells. However, the nano-column structure of the sputtered film on the nanoporous anodic aluminum oxide (AAO) substrate has been showing low performances, possibly originated from low in-plane electrical connectivity and limited reaction area at electrolyte/electrode interface. We report here that application of 10 nm thickness of Pt plasma-enhanced atomic layer deposition (PEALD) on the nanoporous Ni-based anode and Gd doped ceria (GDC) deposited by sputtering dramatically enhances anodic reactions, significantly reduces ohmic and polarization resistances (25% reduction in ohmic, 50% reduction in polarization resistances), and improves the power density over 60% compared to the bare cells. It is noteworthy that Pt PEALD deposited on the nanoporous GDC layer shows much-improved performance compared to that deposited on the nanoporous anode structure. This is attributed to the enhanced contact area at Pt/GDC interface by exceptional conformal deposition of Pt PEALD and improved reaction sites from surface of GDC anode interlayer. |
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| Keywords: | Plasma enhanced atomic layer deposition Sputtering Thin film Nanostructure Low temperature solid oxide fuel cells |
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