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Fabrication of two dimensional high aspect ratio polymer photonic crystal laser
Authors:Jie Zhou  Gang Liu  Xiaobo Zhang  Xueliang Kang  Ying Xiong  Yangchao Tian
Affiliation:1. National Synchrotron Radiation Laboratory, University of Science and Technology of China (USTC), Hefei, China
3. The 38th Research Institute of China Electronics Technology Group Corporation, Hefei, China
2. Department of Optics and Optical Engineering, USTC, Hefei, China
Abstract:Photonic crystals have attracted much attention from researchers because of the control over the propagation and emission of light and particular optical properties. In this paper, we reported on the design, fabrication and test of a two-dimensional polymer photonic crystal laser. First of all, a two-dimensional polymer photonic crystal laser with a triangle-lattice structure was described. Rhodamine 6G doped in PMMA was chosen as the gain material. Then, plane wave method based on the Maxwell equations was utilized to calculate the distribution of the photonic band gap. We calculated the band structure of a triangle lattice photonic crystal with a low refractive index. High resolution electron beam lithography combined with electroplating was used to fabricate the silicon nitride mask. A high aspect ratio two-dimensional photonic crystal laser was fabricated by X-ray lithography in one-step process to overcome the limitation of the thickness by the conventional methods to realize a real two-dimensional laser. Meanwhile, processes of sample preparations and fabrication were optimized in order to avoid the oxidation of the gain material and reduce the diffraction effect on the structures.
Keywords:
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