| 射频磁控溅射制备TiO2光催化薄膜的表征 |
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| 引用本文： | 郑树凯,郝维昌,潘峰,张俊英,王天民.射频磁控溅射制备TiO2光催化薄膜的表征[J].稀有金属材料与工程,2004,33(7):752-754. |
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| 作者姓名： | 郑树凯 郝维昌 潘峰 张俊英 王天民 |
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| 作者单位： | 1. 北京航空航天大学,北京,100083
2. Beijing University of Aeronautics and Astronautics,Beijing,100083,China |
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| 基金项目： | NationalFoundationofNaturalScience(59982002)，theBeijingNovaProgram(H020821250190) |
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| 摘 要： | 在不同的Ar和O2气流量比下，利用射频磁控溅射技术在载波片上制备了TiO2薄膜。利用X射线衍射(XRD)，原子力显微镜(AFM)，拉曼光谱和UV-VIS-NIR分光光度计等技术对薄膜进行了表征。结果表明在Ar：O2=20sccm：5sccm下制备的薄膜具有较高的光催化活性。
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| 关 键 词： | TiO2薄膜 流量比 表面粗糙度 光催化活性 |
Characterization of
TiO2 Photocatalytic Thin Films Prepared by Radiofrequency Sputtering |
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| Zheng Shukai,Hao Weichang,Pan Feng,Zhang Junyeng,Wang Tianmin.Characterization of
TiO2 Photocatalytic Thin Films Prepared by Radiofrequency Sputtering[J].Rare Metal Materials and Engineering,2004,33(7):752-754. |
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| Authors: | Zheng Shukai Hao Weichang Pan Feng Zhang Junyeng Wang Tianmin |
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| Abstract: | TiO2 thin films were prepared on microscope glass slides by radiofrequency magnetron sputtering method under different flow ratios of Ar and O2 gases. The films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), Raman spectroscopy and UV-VIS spectrophotometer. The results indicated that the film prepared under the flow ratio of ArO2=20 sccm5 sccm has a higher photocatalytic activity. |
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| Keywords: | TiO_2 thin film flow ratio surface roughness photocatalytic activity |
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