Oxidation of nanostructured Ti films produced by low energy cluster beam deposition: An X-ray Photoelectron Spectroscopy characterization |
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| Authors: | Monica de Simone Elena SnideroMarcello Coreno Gero BongiornoLuca Giorgetti Matteo AmatiCinzia Cepek |
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| Affiliation: | a CNR-IOM Laboratorio TASC, Area Science Park Basovizza, 34149 Trieste, Italyb CNR-IMIP, c/o Laboratorio TASC Area Science Park Basovizza, 34149 Trieste, Italyc Fondazione Filarete, v.le Ortles 22/4, 20139 Milano, Italyd Istituto Europeo di Oncologia, Dip. di Oncologia Sperimentale, Via Adamello 16, 20139, Milano, Italye Sincrotrone Trieste ScpA, Area Science Park Basovizza, 34149 Trieste, Italy |
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| Abstract: | We used in-situ X-ray Photoelectron Spectroscopy (XPS) to study the oxidation process of a cluster-assembled metallic titanium film exposed to molecular oxygen at room temperature. The nanostructured film has been grown on a Si(111) substrate, in ultra high vacuum conditions, by coupling a supersonic cluster beam deposition system with an XPS experimental chamber. Our results show that upon in-situ oxygen exposure Ti3 + is the first oxidation state observed, followed by Ti4 +, whereas Ti2 + is practically absent during the whole process. Our results compare well with the existing literature on Ti films produced using other techniques. |
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| Keywords: | Nanostructures Low energy cluster beam deposition X-ray Photoelectron Spectroscopy (XPS) Oxidation |
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