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多弧离子镀TiN涂层工艺及相结构
引用本文:叶卫平,宫秀敏,孙伟,许大庆. 多弧离子镀TiN涂层工艺及相结构[J]. 金属热处理, 1998, 0(10)
作者姓名:叶卫平  宫秀敏  孙伟  许大庆
作者单位:武汉汽车工业大学材料系,华中理工大学
摘    要:探讨了多弧离子镀技术中预轰击时间、氮分压和靶电流等对高速钢TiN涂层的影响。结果表明,在不同的工艺条件下,TiN涂层的相结构组成基本相同,但相对量不一样。当氮分压降低时或当预轰击时间延长时,涂层的硬度增大,耐磨性能改善。当靶电流减小时,涂层的硬度和耐磨性能降低。

关 键 词:TiN涂层  多弧离子镀  预轰击时间  氮分压  靶电流

Multi arc Techniques of TiN Coatings and Phase Structure
Ye Weiping,Gong Xiumin,Sun Wei. Multi arc Techniques of TiN Coatings and Phase Structure[J]. Heat Treatment of Metals, 1998, 0(10)
Authors:Ye Weiping  Gong Xiumin  Sun Wei
Abstract:The main deposition parameters of multi arc TiN coating techniques include prebombarding time,N 2 partial pressure and target current,their influences on the coating phase structure,adhesive,microhardness and wear resistance are investigated by SEM,XRD,adhesive scratch tester and others.The results show that the microstructure of coatings is essentially the same,but the relative quantities are different.The experimental techniques show that if the N 2 partial pressure is lower or the pre bombarding time is prolonged,the hardness of coatings is increased and if the target current is smaller,the hardness of coatings is decreased.
Keywords:TiN coating  multi arc ion plating  pre bombarding time  N 2 partial pressrue  targer current
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