首页 | 本学科首页   官方微博 | 高级检索  
     


Stress-based performance evaluation of osseointegrated dental implants by finite-element simulation
Authors:Luigi Baggi   Ilaria Cappelloni   Franco Maceri  Giuseppe Vairo  
Affiliation:aSchool of Dentistry, University of Rome “Tor Vergata”, 00133 Roma, Italy;bDepartment of Mechanical Engineering, University of Rome “Tor Vergata”, 00133 Roma, Italy;cDepartment of Civil Engineering, University of Rome “Tor Vergata”, 00133 Roma, Italy
Abstract:In this paper biomechanical interaction between osseointegrated dental implants and bone is numerically investigated through 3D linearly elastic finite-element analyses, when static functional loads occur. Influence of some mechanical and geometrical parameters on bone stress distribution is highlighted and risk indicators relevant to critical overloading of bone are introduced. Insertions both in mandibular and maxillary molar segments are analyzed, taking into account different crestal bone loss configurations. Stress-based performances of five commercially-available dental implants are evaluated, demonstrating as the optimal choice of an endosseous implant is strongly affected by a number of shape parameters as well as by anatomy and mechanical properties of the site of placement. Moreover, effectiveness of some double-implant devices is addressed. The first one is relevant to a partially edentulous arch restoration, whereas other applications regard single-tooth restorations based on non-conventional endosteal mini-implants. Starting from computer tomography images and real devices, numerical models have been generated through a parametric algorithm based on a fully 3D approach. Furthermore, effectiveness and accuracy of finite-element simulations have been validated by means of a detailed convergence analysis.
Keywords:3D finite-element simulation   Dental biomechanics   Osseointegrated dental implants   Platform switching influence   Trabecular bone quality influence
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号