| 一种含有盐酸胍的新型TSV抛光液 |
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| 引用本文： | 洪姣,刘玉岭,张保国,牛新环,韩力英.一种含有盐酸胍的新型TSV抛光液[J].半导体学报,2015,36(10):106003-5. |
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| 作者姓名： | 洪姣 刘玉岭 张保国 牛新环 韩力英 |
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| 基金项目： | Project supported by the Major National Science and Technology Special Projects;the Fund Project of Hebei Provincial Department of Education;China;the Natural Science Foundation of Hebei Province;China;and Colleges and Universities Scientific research project of Hebei Province;China |
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| 摘 要： | 本文中,对一种新型的含有盐酸胍的TSV抛光液在CMP(化学机械平坦化)中的性能进行了研究,该TSV抛光液是一种碱性抛光液,并且不含任何抑制剂。在抛光过程中,盐酸胍作为一种有效的表面复合单元,相对于铜和介质的去除速率,钛的去除速率是可以通过调节选择性来控制的。在TSV生产过程中对于表面蝶形坑的修正及得到好的表面平整度是有利的。本文主要研究了抛光液成分的作用机理以及盐酸胍在TSV抛光液中的巧妙应用。
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| 关 键 词： | TSV alkaline slurry guanidine hydrochloride removal rate selectivity |
A novel kind of TSV slurry with guanidine hydrochloride |
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| Hong Jiao,Liu Yuling,Zhang Baoguo,Niu Xinhuan and Han Liying.A novel kind of TSV slurry with guanidine hydrochloride[J].Chinese Journal of Semiconductors,2015,36(10):106003-5. |
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| Authors: | Hong Jiao Liu Yuling Zhang Baoguo Niu Xinhuan and Han Liying |
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| Affiliation: | 1. School of Electronic Information Engineering, Hebei University of Technology, Tianjin 300130, China;Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300130, China;2. School of Electronic Information Engineering, Hebei University of Technology, Tianjin 300130, China |
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| Abstract: | The effect of a novel alkaline TSV (through-silicon-via) slurry with guanidine hydrochloride (GH) on CMP (chemical mechanical polishing) was investigated.The novel alkaline TSV slurry was free of any inhibitors.During the polishing process, the guanidine hydrochloride serves as an effective surface-complexing agent for TSV CMP applications, the removal rate of barrier (Ti) can be chemically controlled through tuned selectivity with respect to the removal rate of copper and dielectric, which is helpful to modifying the dishing and gaining an excellent topography performance in TSV manufacturing.In this paper, we mainly studied the working mechanism of the components of slurry and the skillful application guanidine hydrochloride in the TSV slurry. |
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| Keywords: | TSV alkaline slurry guanidine hydrochloride removal rate selectivity |
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