Surface modification and metallization of polyimide using gold colloids as a seed layer |
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Authors: | Yong Kong Jianqun Shao Wenchang Wang Zhidong Chen Haixia Chu |
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Affiliation: | 1. Department of Chemical Engineering, Jiangsu Polytechnic University, Changzhou 213164, China;2. Department of Chemical Biology, School of Chemical Biology and Pharmaceutical Sciences, Capital Medical University, Beijing 100069, China |
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Abstract: | Herein we report on metallization of Cu on to surface‐modified polyimide resin, the method of which relies on potassium hydroxide‐induced modification of the polyimide surface to introduce carboxylic acid groups and incorporation of gold colloids as a seed layer through reduction of chloroauric acid. The contact angle of modified polyimide surface with water changed from 70 to 35° due to the hydrolysis of polyimide. Secondary amine group on the surface was detected with attenuated total reflection (ATR) Fourier transform infrared (FTIR) spectrophotometry, suggesting that tertiary amine group has turned into secondary group. In addition, on the basis of hydrophilic behavior, we succeeded in depositing gold colloids on the chemically modified surface. SEM image of copper electroless plated on polyimide surface indicated that copper particles were compact and about ~ 300 nm in diameter. It showed that gold colloids provide an excellent conductive layer to catalyze the electroless plating of Cu on polyimide surface. © 2008 Wiley Periodicals, Inc. J Appl Polym Sci, 2009 |
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Keywords: | polyimide surface modification gold colloids metallization |
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