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Photolithography: Fabrication of Flexible Binary Amplitude Masks for Patterning on Highly Curved Surfaces (Adv. Funct. Mater. 20/2009) |
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| Authors: | Audrey M. Bowen Ralph G. Nuzzo |
| Affiliation: | Department of Chemistry Frederick Seitz Materials Research Laboratory University of Illinois at Urbana‐Champaign Urbana, IL, 61801 (USA) |
| Abstract: | |
| Keywords: | Soft lithography Patterning Poly(dimethylsiloxane) |