A General Approach to Semimetallic,Ultra‐High‐Resolution,Electron‐Beam Resists |
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Authors: | Bao‐Yu Zong Gu‐Chang Han Yuan‐Kai Zheng Li‐Hua An Tie Liu Ke‐Bin Li Jin‐Jun Qiu Zai‐Bing Guo Ping Luo Hao‐Min Wang Bo Liu |
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Affiliation: | Data Storage Institute (A*STAR) Agency for Science, Technology and Research DSI Building, 5 Engineering Drive 1, Singapore 117608 (Singapore) |
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Abstract: | Commercial electron‐beam resists are modified into semimetallic resists by doping with 1–3 nm metal nanoparticles, which improve the resolution, contrast, strength, dry‐etching resistance, and other properties of the resist. With the modified resists, fine resist nanopatterns from electron‐beam lithography are readily converted into 5–50 nm, high‐quality multilayers for metallic nanosensors or nanopatterns via ion‐beam etching. This method solves the problem of the fabrication of fine (<50 nm) metallic nanodevices via pattern transferring. |
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Keywords: | doping dry etching nanopatterning nanosensors resist materials |
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