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Calix[4]resorcinarene Derivatives as High‐Resolution Resist Materials for Supercritical CO2 Processing
Authors:Nelson M Felix  Anuja De Silva  Christopher K Ober
Affiliation:1. School of Chemical and Biomolecular Engineering, Cornell University, Ithaca, NY 14853 (USA);2. Department of Chemistry and Chemical Biology, Cornell University, Ithaca, NY 14853 (USA);3. Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853 (USA)
Abstract:
Keywords:microfabrication  nanolithography  photolithography  supercritical fluids
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