| 硅基周期槽结构的刻蚀工艺研究 |
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| 引用本文： | 魏玉明,陈长英,陈麟. 硅基周期槽结构的刻蚀工艺研究[J]. 光学仪器, 2016, 38(3): 272-277. DOI: 10.3969/j.issn.1005-5630.2016.03.016 |
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| 作者姓名： | 魏玉明 陈长英 陈麟 |
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| 作者单位： | 上海理工大学上海市现代光学系统重点实验室,上海200093;上海理工大学光电信息与计算机工程学院,上海200093 |
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| 基金项目： | 国家自然科学基金资助项目(11174207、61138001、61007059、61205094);上海市自然科学基金资助项目(11ZR1425000);国家重大仪器科学专项(2011YQ150021) |
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| 摘 要： | 针对微电子机械系统(MEMS)湿法槽刻蚀技术,基于硅材料各向异性腐蚀特性研究了硅基周期槽的湿法刻蚀工艺,得出了优化的光刻参数。通过对比实验详细分析了搅拌在腐蚀过程中起到的重要作用,实验结果显示,搅拌可以增加腐蚀溶液的流通性,使硅表面不易产生气泡形成"伪掩膜"阻碍反应的进行,从而制备出表面光滑平整的周期槽结构。同时,在搅拌的条件下对槽深和腐蚀时间的关系也做出了相应的分析。为硅微机械加工技术的进一步研究提供了参考。
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| 关 键 词： | 微电子机械系统(MEMS) 各向异性 刻蚀 搅拌 周期槽 |
| 收稿时间： | 2015-09-09 |
Study on etching process of silicon based periodic groove structure |
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| WEI Yuming,CHEN Changying and CHEN Lin. Study on etching process of silicon based periodic groove structure[J]. Optical Instruments, 2016, 38(3): 272-277. DOI: 10.3969/j.issn.1005-5630.2016.03.016 |
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| Authors: | WEI Yuming CHEN Changying CHEN Lin |
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| Affiliation: | Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China;School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China,Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China;School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China and Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China;School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China |
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| Abstract: | Due to the importance of micro-electro-mechanical system(MEMS)wet etching technique, the fabrication of periodic groove structure based on anisotropic etching are proposed in this paper.And the optimal lithography parameters are obtained by several experiments.On the basis of this, we observe that the stirring plays an important role in the wet etching technique.Stirring can increase the liquidity of the corrosion solution so that the silicon surface is not easy to generate bubbles to form "false mask", which can stop the reaction of the silicon and the solution.Then the surface of the periodic groove structure is very smooth.Furthermore, the relationship between the groove depth and the etching time is also analyzed in this paper.This research is of great significance for silicon micro mechanical processing technology. |
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| Keywords: | micro-electro-mechanical system(MEMS) anisotropic etching stirring periodic groove |
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