| 工件台偏压对非平衡磁控溅射沉积MoS_2-Ti薄膜的结构与性能影响 |
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| 引用本文： | 郑军,周晖,温庆平,万志华,桑瑞鹏. 工件台偏压对非平衡磁控溅射沉积MoS_2-Ti薄膜的结构与性能影响[J]. 润滑与密封, 2010, 35(4). DOI: 10.3969/j.issn.0254-0150.2010.04.007 |
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| 作者姓名： | 郑军 周晖 温庆平 万志华 桑瑞鹏 |
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| 作者单位： | 兰州物理研究所表面工程技术国防科技重点实验室,甘肃兰州,730000 |
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| 摘 要： | 采用非平衡磁控溅射技术制备MoS2-Ti薄膜,研究工件台偏压对薄膜结构和性能的影响。利用XRF和XRD分析薄膜的成分和晶相结构,用CSM薄膜综合性能测试仪测试薄膜的厚度、硬度以及膜与基体的结合力,采用球-盘摩擦磨损试验机评价薄膜在真空环境下的摩擦学性能。结果表明:MoS2-Ti薄膜具有明显的(002)优势取向,薄膜中S、Mo原子比及膜厚随偏压的增加而减小,薄膜硬度及膜-基体附着力随偏压的增加而增大,薄膜在真空环境中的平均摩擦因数为0.02,受偏压影响不明显,薄膜寿命受偏压影响明显,当偏压在-100 V内变化时薄膜具有较长的寿命且随偏压的增加而增长,偏压继续增大薄膜耐磨寿命下降明显,当偏压为-200 V时薄膜不具备润滑性能。
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| 关 键 词： | 非平衡磁控溅射 MoS2-Ti复合薄膜 工件台偏压 结构和性能 |
Influence of Substrate Bias Voltage on the Structure and Performance MoS_2-Ti Coatings Deposited by Unbalanced Magnetron Sputtering |
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| Zheng Jun Zhou Hui Wen Qingping Wan Zhihua Sang Ruipeng. Influence of Substrate Bias Voltage on the Structure and Performance MoS_2-Ti Coatings Deposited by Unbalanced Magnetron Sputtering[J]. Lubrication Engineering, 2010, 35(4). DOI: 10.3969/j.issn.0254-0150.2010.04.007 |
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| Authors: | Zheng Jun Zhou Hui Wen Qingping Wan Zhihua Sang Ruipeng |
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| Affiliation: | Zheng Jun Zhou Hui Wen Qingping Wan Zhihua Sang Ruipeng(Lanzhou Institute of Physics,National Key Lab of Surface Engineering,Lanzhou Gansu 730000,China) |
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| Abstract: | MoS2-Ti coatings were grown by unbalanced magnetron sputtering at different substrate bias voltages.The effect of substrate bias voltages on its structure and mechanical performance was studied.The composition and crystal structure of coatings were analyzed by XRF and XRD,the thickness,adhesion and hardness were measured by CSM nano-scratch tester and nano-hardness tester,the tribological properties were evaluated in dry sliding tests using a vacuum rotational ball-on-disc apparatus.The results show that Mo... |
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| Keywords: | unbalanced magnetron sputtering MoS2-Ti coatings substrate bias voltage structure and performance |
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