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Atomic layer deposition and characterization of biocompatible hydroxyapatite thin films |
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| Authors: | Matti Putkonen,Timo Sajavaara,Leiting Xu,Lauri Niinistö |
| Affiliation: | a Beneq Oy, Ensimmäinen savu, FI-01510 Vantaa, Finland b Department of Physics, University of Jyväskylä, P.O. Box 35 (YFL), FIN-40014, Jyväskylä, Finland c Department of Health Sciences, University of Jyväskylä, P.O. Box 35 (LL), FIN-40014, Jyväskylä, Finland d Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O. Box 6100, FI-02015 Espoo, Finland |
| Abstract: | Atomic layer deposition (ALD) was used to produce hydroxyapatite from Ca(thd)2 (thd = 2,2,6,6-tetramethyl-3,5-heptanedionato) and (CH3O)3PO onto Si(100) and Corning (0211). Film crystallinity, stoichiometry, possible impurities and surface morphology were determined. The as-deposited films contained significant amounts of carbonate impurities however, annealing at moist N2 flow reduced the carbonate content even at 400 °C. The as-deposited Ca-P-O films were amorphous but rapid thermal annealing promoted the formation of the hydroxyapatite phase. Mouse MC 3T3-E1 cells were used for the cell culture experiments. According to the bioactivity studies cell proliferation was enhanced on as-deposited ALD-grown Ca-P-O films and greatly enhanced on films annealed at 500 °C in comparison with reference cells on borosilicate glass or cell culture polystyrene. |
| Keywords: | Atomic layer deposition Biocompatibility Hydroxyapatite Cell culture |
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