| 金属的光电化学方法防腐蚀原理及研究进展 |
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| 引用本文： | 张鉴清,冷文华,程小芳,刘东坡.金属的光电化学方法防腐蚀原理及研究进展[J].中国腐蚀与防护学报,2006,26(3):188-192. |
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| 作者姓名： | 张鉴清 冷文华 程小芳 刘东坡 |
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| 作者单位： | 浙江大学玉泉校区化学系 |
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| 摘 要： | 自上世纪70年代以来，半导体特别是TiO2光电催化反应在诸多领域应用引起了广泛研究.近年来研究表明它可用于金属的阴极保护.文中对金属的光电化学方法防腐蚀的化学原理及研究现状进行了简要介绍.
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| 关 键 词： | 光电化学 半导体 阴极保护 腐蚀 |
| 文章编号： | 1005-4537（2006）03-0188-05 |
| 收稿时间： | 2005-12-10 |
| 修稿时间： | 2005-12-10 |
PRINCIPLES OF PHOTOELECTROCHEMICAL APPROACH FOR METAL ANTICORROSION AND CURRENT STATUS |
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| ZHANG Jianqing,LENG Wenhua,CHENG Xiaofang,LIU Dongpo.PRINCIPLES OF PHOTOELECTROCHEMICAL APPROACH FOR METAL ANTICORROSION AND CURRENT STATUS[J].Journal of Chinese Society For Corrosion and Protection,2006,26(3):188-192. |
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| Authors: | ZHANG Jianqing LENG Wenhua CHENG Xiaofang LIU Dongpo |
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| Affiliation: | 1. Department of Chemistry, Zhejiang University, Hangzhou 310027 ; 2. State Key Laboratory for Corrosion and Protection, Shenyang 110016 |
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| Abstract: | There have been widely investigated on the application of semiconductor photoelectrochemical reaction since 1972, particularly TiO2 photocatalysis. In recent years it has been demonstrated that it can apply to the cathodic protection for metal. In this paper the principles of photoelectrochemical approach for metal anticorrosion are briefly presented and it current status are reviewed. |
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| Keywords: | photoelectrochemistry semiconductor cathodic protection corrosion |
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