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Experimental Evaluation of Reliability of Deep Submicron SOI MOS Transistors at High Temperatures
Authors:A S Benediktov  N A Shelepin  P V Ignatov
Affiliation:1.Molecular Electronics Research Institute (MERI),Zelenograd, Moscow,Russia
Abstract:In this paper, 0.18–0.5 μm SOI MOS transistors are tested for compliance with the reliability criteria applied to high-temperature electronics and their components. The main parameters of SOI MOS transistors are measured in the temperature range from ?60 to +300°С. The specific behavior exhibited by SOI MOS transistors at high temperatures should be taken into account when designing high-temperature integrated circuits so as to avoid premature failures and increase the reliability of devices.
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