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酸性蚀刻废液中铜的回收及废液再生新技术
引用本文:黄铮铮,周军,刘红江,陈建敏. 酸性蚀刻废液中铜的回收及废液再生新技术[J]. 印制电路信息, 2013, 0(5): 113-116
作者姓名:黄铮铮  周军  刘红江  陈建敏
作者单位:湖南万容科技股份有限公司,湖南长沙411100
摘    要:为了生态环境和人们身体健康,研究和开发酸性蚀刻液再生利用方法及设备,实现清洁生产,已成为印制线路板行业污染防治工作的重点。文章介绍了一种酸性蚀刻液再生利用的新方法:采用膜电解技术,硫酸作为阳极液,蚀刻废液作为阴极液,将蚀刻废液中的铜离子沉积在阴极板上形成致密的铜板,铜离子浓度降低至1g/L,氢离子浓度上升至3.6m01/L,提铜后的蚀刻废液可当盐酸回用于酸性蚀刻液的配制中。实验结果表明:阴极液铜离子浓度为(15~5)g/L,电流密度为4.16A/dm^2为该电解工艺的最佳参数,能得到纯度高于99%的铜板,并达到80%以上的电流效率,而酸度对该电解工艺影响不大。

关 键 词:印制线路板  酸性蚀刻液  膜电解  再生利用

Recent research development of acid etching liquid waste regeneration technology
HUANG Zheng-zheng,ZHOU Jun,LIU Hong-jiang,CHEN Jian-min. Recent research development of acid etching liquid waste regeneration technology[J]. Printed Circuit Information, 2013, 0(5): 113-116
Authors:HUANG Zheng-zheng  ZHOU Jun  LIU Hong-jiang  CHEN Jian-min
Affiliation:HUANG Zheng-zheng ZHOU Jun LIU Hong-jiang CHEN Jian-min
Abstract:Research of acid etching solution regeneration technology and realizing clean production have been stressed in prevention and control of pollution work in the industry of printed circuit boards for ecosystem and people's health. This paper presents the method for the membrane electrolytic regeneration of acid etching solution, using sulfuric acid as anolyte and acid etching solution as catholyte. The Cu^2+ in catholyte is reduced to dense copperplate with decreasing the concentration of Cu^2+ to I g/L and increasing that of H^+ to 3.6 mol/L. The spent acid etching solution after extracting copper can be used as hydrochloric acid during etching solution preparation. The results showed that when the initial concentration of Cu2+ is (15-5)g/L and the current density is 4.16 A/dm2, a high current efficiency of 80% can be achieved and the purity of obtained copperplate is higher than 99%, however, the initial concentration of H^+ has little impact.
Keywords:Printed Circuit Board  Acid Etching Solution  Membrane Electrolysis  Regeneration
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