| 电泳沉积法制备CuO薄膜的微观结构分析 |
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| 引用本文： | 石锋,李玉国,孙钦军. 电泳沉积法制备CuO薄膜的微观结构分析[J]. 半导体光电, 2010, 31(1): 87-89 |
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| 作者姓名： | 石锋 李玉国 孙钦军 |
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| 作者单位： | 山东师范大学物理与电子科学学院,济南,250014;山东师范大学物理与电子科学学院,济南,250014;山东师范大学物理与电子科学学院,济南,250014 |
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| 摘 要： | 在经清洗后的硅(111)衬底上,分别采用电泳过程中氧化制备CuO薄膜和电泳制备Cu膜后退火氧化制备CuO薄膜。用XRD和SEM对薄膜样品进行了组分、表面形貌等微观结构的分析,发现两种方法制备的CuO薄膜的组分基本一致,但形貌完全不同,前者是由非常均匀的CuO小颗粒(200nm)相连而成团簇状,后者是由一些大小均匀的半径约为200nm的CuO小颗粒和气孔相互交融紧密连接而成的条状或块状。电泳过程中氧化制备的CuO薄膜结晶质量较好。
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| 关 键 词： | 电泳沉积法 CuO薄膜 微观结构 |
Microstructure Analysis of CuO Thin Films Fabricated with Electrophoretic Deposition Method |
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| SHI Feng,LI Yuguo,SUN Qinjun. Microstructure Analysis of CuO Thin Films Fabricated with Electrophoretic Deposition Method[J]. Semiconductor Optoelectronics, 2010, 31(1): 87-89 |
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| Authors: | SHI Feng LI Yuguo SUN Qinjun |
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| Affiliation: | College of Physics and Electronics;Shandong Normal University;Jinan 250014;CHN |
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| Abstract: | Electrophoretic deposition method was adopted to deposite CuO thin films on cleaned Si(111)substrates.Some of the samples of CuO films were fabricated by oxidation in electrophoretic process and the others were fabricated by oxidation after annealing Cu thin films in air.XRD and SEM were used to analyze the microstructure of CuO films,like components and surface topography.It is found that CuO films fabricated with the two methods basically have the same components but totally different surface topography.C... |
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| Keywords: | electrophoretic deposition method CuO thin films microstructure |
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