Topological transformation of submicron VLSIs for the double lithographic mask technology

One of the main problems in the topological transformation of submicron VLSIs for the double lithographic mask technology is the decomposition of the initial topological layer into two new ones. Transformation algorithms of the VLSI topology for the double lithographic mask technology, which are oriented towards the application of high-performance computing systems, as well as the results of experimental investigations, which are performed using the developed software, are discussed. The advantages and disadvantages of the suggested approaches are discussed.