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The APΓO-2 technological facility for ion-beam-assisted deposition |
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| Authors: | A G Guglya Yu A Marchenko N V Perun I V Sassa I V Lopatin A S Tishchenko |
| Affiliation: | (1) National Scientific Center, Kharkov Institute of Physics and Technology, ul. Akademicheskaya 1, Kharkov, 61108, Ukraine;(2) Usikov Institute of Radiophysics and Electronics, National Academy of Sciences of Ukraine, ul. Akademika Proskury 12, Kharkov, 61085, Ukraine |
| Abstract: | The APΓO-2 technological facility for ion-beam-assisted deposition is described. This facility is used to obtain composite coatings under bombardment by gas ions with energies of several tens of keV. The design features of the Penning-type ion source and the double-arm electron-beam evaporator are presented. |
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