Improved chemical resistance of ink‐jet printed micropatterns on glass by using dual‐functional compositions

UV curable and UV/moisture dual‐functional oligomers were synthesized by grafting trimethoxysilane and methacrylate segments on the polyimide oligomer chains. These oligomers and a dual‐functional monomer were used as ink compositions to enhance the chemical resistance of ink‐jet printed LCD color filter micropatterns, without sacrificing jetting performance. The molecular structure and molecular weight of the oligomers were altered to adjust the solubility of oligomer in monomers, together with jetting trajectory, drop size uniformity, and deposition accuracy of the ink‐jet inks. The chemical resistance, optical property, and mechanical property of the printed patterns depend on the oligomer structure, the arrangement of trimethoxysilane groups, and the molecular chain length. Straight lines and uniform dot arrays with excellent chemical resistance can be achieved. Dot patterns made of polymer‐silica hybrid materials and pigments remain unchanged after being immersed in γ‐butyrolactone for 200 min. © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 130: 2049–2055, 2013