| EL薄膜的溅射工艺 |
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| 引用本文： | 郭淑慈. EL薄膜的溅射工艺[J]. 真空电子技术, 1993, 0(4): 40-42 |
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| 作者姓名： | 郭淑慈 |
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| 作者单位： | 上海电子管厂 |
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| 摘 要： | 本文介绍了采用分立型复合溅射靶制造 EL 薄膜的工艺。用这种方法可严格控制 EL 薄膜的化学计量及掺杂含量,并使掺杂物在薄膜里呈梯度分布。
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| 关 键 词： | EL 薄膜 溅射工艺 分立型复合溅射靶 掺杂含量 掺杂物梯度分布 |
Sputtering Process for Making EL Films |
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| Guo Shuci. Sputtering Process for Making EL Films[J]. Vacuum Electronics, 1993, 0(4): 40-42 |
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| Authors: | Guo Shuci |
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| Affiliation: | Shanghai Electron Tube Factory |
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| Abstract: | This article relates to a sputtering process for producing EL films by adopting a plurality of discrete sputtering targets.Thus the stoichiometry and doping levels of the above EL films can be closely controled and a graded dopant profile can be provided in the films. |
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| Keywords: | EL film sputtering process a plurality of discrete sputtering targets doping level a graded dopant profile |
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