V-5Cr-5Ti在AlCl3-EMIC离子液体中的阳极活化及表面铝沉积

钒合金表面获得性能优良的Al涂层是在其表面制备V-Al/Al₂O₃阻氚涂层的重要基础。针对聚变堆候选结构材料V-5Cr-5Ti，本文采用电化学方法研究了其在AlCl₃-EMIC（摩尔比为2∶1）离子液体中的阳极行为，比较分析了恒电位极化模式下不同电位、极化时间对表面阳极活化的影响。在此基础上，采用恒电流沉积（16 mA/cm²）模式研究了阳极活化电位、沉积时间和温度对镀层的影响。结果表明：阳极氧化电流在1.25 V（参比Al的电位）电位时出现峰值，在该电位下极化15 min，V-5Cr-5Ti基体可获得腐蚀均匀的可再生表面。16 mA/cm²下铝沉积，活化表面为（111）和（200）方向择优生长的纯铝涂层，与基体结合良好，室温下沉积75 min，可获得20 μm厚性能良好的铝涂层。

Anodic Etching and Al Electrodeposition of V-5Cr-5Ti within AlCl3-EMIC Ionic Liquid

The Al coating with fine performance on V‐alloy surface is an important foun‐dation for the fabrication of V‐Al/Al2 O3 as tritium permeation barrier .In present work , the anodic behavior of V‐5Cr‐5Ti (a candidate structural material of fusion reactor ) in AlCl3‐EMIC (with molar ratio of 2∶1) ionic liquid was studied by electrochemical anal‐ysis .The influences of different potentials and time on anodic etching of V‐5Cr‐5Ti were investigated by potentiostatically anodic polarization .And on this basis ,the effects of
anodic potential ,deposition time and temperature on Al coatings were studied under constant current density (16 mA/cm2 ) .The results show that the anodic oxidation cur‐rent reaches maximum when anodic potential is 1.25 V ,and the uniform and reproduci‐ble surface of V‐5Cr‐5Ti is obtained by etching with this potential for 15 min .With the current density of 16 mA/cm2 ,the coatings are pure Al with preferred orientation of (111) and (200) ,and well adhesion .A compact and integral Al coating with thickness of 20 μm can be obtained after 75 min at 16 mA/cm2 under room temperature .