| 二氧化锡溅射工艺研究 |
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| 引用本文： | 冯海玉,黄元庆,冯勇建. 二氧化锡溅射工艺研究[J]. 微纳电子技术, 2003, 0(Z1) |
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| 作者姓名： | 冯海玉 黄元庆 冯勇建 |
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| 作者单位： | 厦门大学机电工程系 福建厦门361005(冯海玉，黄元庆)，厦门大学萨本栋微机电研究中心 福建厦门361005(冯勇建) |
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| 摘 要： | SnO2 是最早使用也是目前使用最广泛的一种气敏材料 ,使用该材料设计制作的气敏传感器具有许多优点。在简要介绍溅射镀膜的成膜过程和特点的基础上 ,着重介绍了SnO2 膜的制备流程 ,分析了功率和温度变化对成膜质量的影响
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| 关 键 词： | SnO2膜 溅射功率 基片温度 |
Study on sputtering process of tin oxide |
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| FENG Hai yu ,HUANG Yuan qing ,FENG Yong jian. Study on sputtering process of tin oxide[J]. Micronanoelectronic Technology, 2003, 0(Z1) |
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| Authors: | FENG Hai yu HUANG Yuan qing FENG Yong jian |
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| Affiliation: | FENG Hai yu 1,HUANG Yuan qing 1,FENG Yong jian 2 |
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| Abstract: | SnO 2 is the one of gas sensitivity materials that are used the earliest and the most widely, gas sensitivity sensors made of this material have many advantages. Based on the simple introduction of the course of sputtering film plating and characteristic, the preparation flow is introduced in detail, the effects of power or temperature changing on the film quality are analyzed. |
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| Keywords: | SnO 2 film sputtering power substrate temperature |
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