New concept for applying edge line phase-shifting masks to arbitrary mask layouts |
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Authors: | M. Weiß W. Henke |
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Affiliation: | Fraunhofer-Institut für Siliziumtechnologie (ISiT), Fraunhoferstr. 1, D-25524, Itzehoe, Germany |
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Abstract: | This paper explains the principle of a method which avoids printing of phantom resist lines due to undesired intensity minima appearing on Cr-less edge line phase-shifting masks. The method combines principles of grey-tone lithography and attenuated phase-shifting masks to give, what we call, a Cr-Less Attenuated Phase-shifting mask (CLAP). Rules for generating a CLAP design and a paradigm setup of a CLAP mask are presented. The capabilities and possible limitations of the CLAP method based on simulated results for a standard wafer stepper setup using the SOLID lithography simulator are being assessed. |
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