| 射频磁控溅射制备ZnO纳米薄膜的研究 |
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| 引用本文： | 李静,吴孙桃,钟灿.射频磁控溅射制备ZnO纳米薄膜的研究[J].微纳电子技术,2003(Z1). |
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| 作者姓名： | 李静 吴孙桃 钟灿 |
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| 作者单位： | 厦门大学萨本栋微机电研究中心，厦门大学萨本栋微机电研究中心，厦门大学萨本栋微机电研究中心 福建，厦门361005，福建，厦门361005，福建，厦门361005，厦门大学物理系，福建，厦门361005 |
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| 摘 要： | 采用磁控溅射的方法来制备ZnO纳米薄膜。薄膜的晶体特性以及表面结构主要通过X射线衍射、扫描电子显微镜及原子力显微镜来进行表征
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| 关 键 词： | ZnO薄膜 射频磁控溅射 X射线衍射 |
The growth of ZnO nano-film by RF magnetic sputtering |
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| LI Jing ,WU Sun tao ,ZHONG Can.The growth of ZnO nano-film by RF magnetic sputtering[J].Micronanoelectronic Technology,2003(Z1). |
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| Authors: | LI Jing WU Sun tao ZHONG Can |
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| Affiliation: | LI Jing 1,WU Sun tao 1,ZHONG Can 1,2 |
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| Abstract: | ZnO nano films were prepared using RF magnetic sputtering technology in different conditions. The properties of film crystal and surface morphology were characterized by X-ray diffraction, scanning electron microscopy, and atomic force microscopy. |
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| Keywords: | ZnO film RF magnetic sputtering X Ray Diffraction |
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