| 纳米SiO2粒子抛光液的制备及其抛光性能 |
| |
| 引用本文： | 雷红,雒建斌,潘国顺. 纳米SiO2粒子抛光液的制备及其抛光性能[J]. 润滑与密封, 2004, 0(3): 84-86 |
| |
| 作者姓名： | 雷红 雒建斌 潘国顺 |
| |
| 作者单位： | 1. 上海大学纳米中心,上海,200436;清华大学摩擦学国家重点实验室,北京,100084
2. 清华大学摩擦学国家重点实验室,北京,100084 |
| |
| 基金项目： | 上海市纳米专项资助项目(0352nm058). |
| |
| 摘 要： | 随着计算机磁头与磁盘间间隙的不断减小，硬盘表面要求超光滑，制备了一种纳米SiO2抛光液，并研究了镍磷敷镀的硬盘基片在其中的抛光性能，Chapman MP2000^ 表面形貌仪测得抛光后表面的平均粗糙度（Rα)和波纹度（Wα)分别为0.052nm及0.063nm，为迄今报道的硬盘抛光的的最低值。原子力显微镜（AFM）发现获得的基片表面非常光滑平整，表面无划痕，凹坑，点蚀等表面缺陷。
|
| 关 键 词： | 硬盘 化学机械抛光 纳米SiO2粒子 抛光液 制备 抛光性能 计算机 |
| 文章编号： | 0254-0150(2004)3-084-3 |
| 修稿时间： | 2003-07-17 |
Preparation of Nanometer SiO2 Slurry and its Polishing Performance on Disk CMP |
| |
| Lei Hong , Luo Jianbin Pan Guoshun. Preparation of Nanometer SiO2 Slurry and its Polishing Performance on Disk CMP[J]. Lubrication Engineering, 2004, 0(3): 84-86 |
| |
| Authors: | Lei Hong Luo Jianbin Pan Guoshun |
| |
| Affiliation: | Lei Hong 1,2 Luo Jianbin 2 Pan Guoshun 2 |
| |
| Abstract: | With magnetic heads operating closer to the disks, the hard disks are forced to be ultra-smooth. Chemical-mechanical polishing of hard disk substrate with nickel-phosphorous plated in the prepared nanometer SiO 2 slurry was studied.Chapman MP2000 +Surface Profiler showed that the average roughness ( Ra ) and waviness ( Wa ) of the surface were reduced to 0 052nm and 0 063nm respectively, those are the lowest value reported to date for hard disk polishing. Atom Force Microscopy (AFM) showd that, a very smooth finishing surface without micro-scratches, pits as well as other micro defects,was obtained. |
| |
| Keywords: | chemical-mechanical polishing (CMP) hard disk substrate nanometer SiO 2 particle slurry |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
