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Nanodiamond films deposited at moderate temperature on pure titanium substrate pretreated by ultrasonic scratching in diamond powder suspension
引用本文:Syed Jawid Askari Fanxiu Lv Akhtar Farid Fengying Wang Qi He Zuyuan Zhou. Nanodiamond films deposited at moderate temperature on pure titanium substrate pretreated by ultrasonic scratching in diamond powder suspension[J]. 北京科技大学学报(英文版), 2006, 13(6): 542-545. DOI: 10.1016/S1005-8850(06)60110-2
作者姓名:Syed Jawid Askari Fanxiu Lv Akhtar Farid Fengying Wang Qi He Zuyuan Zhou
作者单位:[1]Materials Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China [2]ES Department, PNEC, PNS Jauhar, National University of Sciences & Technology, Karachi-75350, Pakistan
基金项目:This work was financially supported by the National Natural Science Foundation of China (No. 50572007) and the Foundation for Doctorial Stations of the Ministry of Education of China.
摘    要:Nanocrystalline diamond (NCD) film deposition on pure titanium and Ti alloys is extraordinarily difficult because of the high diffusion coefficient of carbon in Ti, the large mismatch in their thermal expansion coefficients, the complex nature of the interlayer formed during diamond deposition, and the difficulty to achieve very high nucleation density. In this investigation, NCD films were successfully deposited on pure Ti substrate by using a novel substrate pretreatment of ultrasonic scratching in a diamond powder-ethanol suspension and by a two-step process at moderate temperature. It was shown that by scratching with a 30-μm diamond suspension for 1 h, followed by a 10-h diamond deposition, a continuous NCD film was obtained with an average grain size of about 200 nm. Detailed experimental results on the preparation, characterization, and successful deposition of the NCD films on Ti were discussed.

关 键 词:纳米晶金刚石薄膜 纯钛衬底 成核增殖 中等温度
收稿时间:2006-02-27

Nanodiamond films deposited at moderate temperature on pure titanium substrate pretreated by ultrasonic scratching in diamond powder suspension
Syed Jawid Askari,Fanxiu Lv,Akhtar Farid,Fengying Wang,Qi He,Zuyuan Zhou. Nanodiamond films deposited at moderate temperature on pure titanium substrate pretreated by ultrasonic scratching in diamond powder suspension[J]. Journal of University of Science and Technology Beijing, 2006, 13(6): 542-545. DOI: 10.1016/S1005-8850(06)60110-2
Authors:Syed Jawid Askari  Fanxiu Lv  Akhtar Farid  Fengying Wang  Qi He  Zuyuan Zhou
Affiliation:1. Materials Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China;ES Department, PNEC, PNS Jauhar, National University of Sciences & Technology, Karachi-75350, Pakistan
2. Materials Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China
Abstract:Nanocrystalline diamond (NCD) film deposition on pure titanium and Ti alloys is extraordinarily difficult because of the high diffusion coefficient of carbon in Ti, the large mismatch in their thermal expansion coefficients, the complex nature of the interlayer formed during diamond deposition, and the difficulty to achieve very high nucleation density. In this investigation, NCD films were successfully deposited on pure Ti substrate by using a novel substrate pretreatment of ultrasonic scratching in a diamond powder-ethanol suspension and by a two-step process at moderate temperature. It was shown that by scratching with a 30-μm diamond suspension for 1 h, followed by a 10-h diamond deposition, a continuous NCD film was obtained with an average grain size of about 200 nm. Detailed experimental results on the preparation, characterization, and successful deposition of the NCD films on Ti were discussed.
Keywords:nanocrystalline diamond film   pure Ti substrate   nucleation enhancement   moderate temperature
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