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Chemical sputtering of deuterated carbon surfaces at various surface temperatures
Authors:Jonny Dadras  Predrag S. Krstic
Affiliation:a Department of Physics & Astronomy, University of Tennessee, Knoxville, TN 37996, United States
b Physics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States
Abstract:The chemical sputtering of deuterated amorphous carbon (a-C:D) surfaces irradiated by 1-50 eV deuterium atoms at surface temperatures between 300 and 1000 K was studied using classical molecular dynamics. A quasi-stationary state was reached by cumulative bombardment for each energy and temperature. Results were compared with available experimental data and previous modeling results and the applicability of molecular dynamics for thermally generated processes was discussed. An attempt is made to correct the absence of the thermally stimulated desorption/degassing of hydrogen from the MD simulations, which evolve at the longer time scales.
Keywords:Molecular dynamics   Chemical sputtering   Temperature dependence   Amorphous carbon   Erosion   Deuterated surface
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