Comparison of the properties of ion-plated titanium carbide films prepared by different activation methods

A comparative study was made of titanium carbide films ion plated onto molybdenum by d.c. and r.f. discharge methods, from the point of view of the characteristics of the discharge and the quality of deposits made by each technique. A very high specimen current was achieved in the d.c. discharge method. Stoichiometric TiC deposits were easily obtained in a wide range of the pressure ratio of C₂H₂ gas to titanium vapour. In contrast, careful optimization of the deposition conditions was needed in the r.f. discharge method for controlling the stoichiometry of the deposits. Titanium carbide coatings deposited onto molybdenum by the d.c. discharge method showed excellent thermal stability compared with those prepared by the r.f. discharge method. These results indicate the strong influence of the ionization efficiency on the properties of ion-plated titanium carbide deposits.