Preparation and electrical properties of 0.4Pb(Zn1/3Nb2/3)O3-0.6Pb(Zr0.4Ti0.6)O3 thin films by 2-step annealing method |
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Authors: | Sang Chul Youn Woong Kil Choo Kyung Shin Koh |
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Affiliation: | (1) Department of Material Science and Engineering, Korea Advanced Institute of Science and Technology, 373-1 Gusong-Dong, Yusong-Gu, Daejeon, Republic of Korea;(2) Department of Chemistry, Chung-Ang University, 221 HeukSeok-Dong, Dongjak-Gu, Seoul, Republic of Korea |
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Abstract: | Films of (1−x)Pb(Zn1/3Nb2/3)O3-xPb(Zr0.4Ti0.6) O3 (x = 0.6, 40PZN-60PZT) were deposited on Pt/TiO2/ SiO2/Si substrate through spin coating. Using a combination of homogeneous precursor solution preparation and two-step pyrolysis
process, we were able to obtain the 40PZN-60PZT thin films of perovskite phase virtually without pyrochlore phase precipitation
after annealing above 650∘C. But since annealing done at the high temperatures for extended time can cause diffusion of Pt, TiO2 and Si, and precipitation of nonstoichiometric PbO, we adopted 2-step annealing method to circumvent these problems. The
2-step annealed films show dense microstructure than the 1-step films annealed at higher temperature. Furthermore, the root-mean-square
surface roughness of 220 nm thick films which are annealed at 720∘C for 1 min and then annealed at 650∘C for 5 min was found to be 3.9 nm by atomic force microscopy as compared to the 12 nm surface roughness of the film annealed
only at 720∘C for 5 min. The electrical properties of 2-step annealed films are virtually same and those of the 1-step annealed films
annealed at high temperature. The film 2-step annealed at 720∘C for brief 1 min and with subsequent annealing at 650∘C for 5 min showed a saturated hysteresis loop at an applied voltage of 5 V with remanent polarization (P
r) and coercive voltage (V
c) of 25.3 μC/cm2 and 0.66 V respectively. The leakage current density was lower than 10−5A/cm2 at an applied voltage of 5 V. |
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Keywords: | Sol-gel process Dielectric properties PZN solid solution 2-step annealing |
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