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Iridium-based oxides: Recent advances in coloration mechanism, structural and morphological characterization
Authors:J Backholm  E Avendano  A Azens  G de M Azevedo  E Coronel  GA Niklasson  CG Granqvist
Affiliation:aDepartment of Engineering Sciences, The Ångström Laboratory, Uppsala University, P.O. Box 534, SE-751 21 Uppsala, Sweden;bBrazilian Synchrotron Light Laboratory, LNLS, CEP 13084-971 Campinas, SP, Brazil;cCenter of Science and Engineering of Materials, CICIMA, Universidad de Costa Rica, San José, Costa Rica;dChromoGenics Sweden AB, Märstagatan 4, SE-75323 Uppsala, Sweden
Abstract:Films of iridium–tantalum oxide and iridium oxide have been prepared by sputtering and studied regarding their structure and electrochemical properties. X-ray diffraction and transmission electron microscopy showed an average grain size of 3–4 nm for both films. Point energy dispersive X-ray spectrometry showed an inhomogeneous distribution of iridium and tantalum indicating that the iridium–tantalum oxide may be a mixture of small IrO2 and Ta2O5 grains, which is consistent with the determined composition IrTa1.4O5.6. X-ray photoelectron spectroscopy gave valuable information on the stabilization process of the as-deposited films involving an uptake of oxygen, and on a coloration mechanism only including protons.
Keywords:Iridium oxide  Electrochromism  XPS  TEM
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