| 类金刚石薄膜的拉曼光谱研究 |
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| 引用本文： | 朱昌 严一心. 类金刚石薄膜的拉曼光谱研究[J]. 表面技术, 1998, 27(5): 17-18 |
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| 作者姓名： | 朱昌 严一心 |
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| 作者单位： | 西安工业学院仪器系 西安710032(朱昌，严一心)，西安工业学院仪器系 西安710032(杭凌侠) |
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| 摘 要： | 利用脉冲碳等离子体源可以直接在Ｓｉ片和Ｇｅ片镀制类金刚石薄膜。被镀制的类金刚石薄膜一般采用激光拉曼光谱仪进行定性分析。实验结果表明：ＳＰ＾３成分含量与ＳＰ＾２成分含量之比，与放电回路的电压有关，在一定电压范围内，随电压的增加，ＳＰ＾３与ＳＰ＾２之比增大，从而选择出镀制类金刚石薄膜的最佳工艺参数。
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| 关 键 词： | 类金刚石薄膜 碳等离子体源 拉曼光谱 镀膜 金属 |
Studies on Diamond-like Carbon of Raman Spectroscope |
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| Zhu Chang. Studies on Diamond-like Carbon of Raman Spectroscope[J]. Surface Technology, 1998, 27(5): 17-18 |
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| Authors: | Zhu Chang |
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| Abstract: | Diamond-like carbon films were directly deposited onto germanium and silicon by pulse discharge carbon plasma source. The deposited films were characterized by Raman spectroscope. The results show that the ratio of sp3 to sp2 bonds of the deposited films increases with increasing discharge voltage. The optimum conditions for depositing diamond-like carbon coating was achieved by optimizing the deposition process. |
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| Keywords: | Diamond-like carbon film Carbon plasma source Raman spectroscope |
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