| RTP设备温度场控制模型及控制算法设计 |
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| 引用本文： | 蒋玉雷,袁俊杰. RTP设备温度场控制模型及控制算法设计[J]. 北方工业大学学报, 2014, 26(1): 32-37 |
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| 作者姓名： | 蒋玉雷 袁俊杰 |
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| 作者单位： | 北方工业大学机电工程学院,100144,北京;北方工业大学机电工程学院,100144,北京 |
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| 基金项目： | 北京市教委科技计划面上项目 |
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| 摘 要： | RTP工艺是当今半导体制造过程中使用最广泛的热处理方法,其温度场具有升温速度快和均匀性好的特点,但随着硅晶圆的尺寸不断增大,现已达到400mm,给RTP设备的温度控制带来了困难.为得到良好的温度均匀性,本文提出了一个分区控制策略.基于对温度场内的辐射传热的分析,将温度场分成了3个区域,并计算出各区域之间的热传导的热流量,最后根据能量守恒定律得到了温度场的控制模型.针对模型的时变性和迟滞性的特点,以及温度场升温速度和均匀性的要求,设计了一个基于Fuzzy-PID的控制系统,通过Matlab仿真证明了该控制算法的有效性.本模型可用于控制系统的设计,也可用于加热装置结构的优化设计.
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| 关 键 词： | RTP 辐射传热 分区控制 模糊PID |
Algorithm of Control Modeling and Design for Temperature Field of RTP System |
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| Jiang Yulei Yuan Junjie. Algorithm of Control Modeling and Design for Temperature Field of RTP System[J]. Journal of North China University of Technology, 2014, 26(1): 32-37 |
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| Authors: | Jiang Yulei Yuan Junjie |
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| Affiliation: | Jiang Yulei Yuan Junjie (Col. of Mechanical and Electronical Engineering, North China Univ. o{ Tech. , 100144, Beijing, China) |
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| Abstract: | RTP has been widely used in the semiconductor manufacturing process its temperature field has the features of high ramp heating rate and excellent uniformity. Some difficulties of temperature control come up with the increasing scale of wafer which is now reaching 400mm. To a- chieve high uniformity, a control strategy based on separated zones is proposed. According to the distribution of radiation generated by halogen tungsten lamps, the temperature field of wafer is sepa- rated into 3 zones. Considering the conduction between two adjacent zones,a temperature model is obtained. A control system based on Fuzzy-PID is designed and simulated in Matlab,and proven to be efficient. The model calculated here could be used to design the control algorithm and optimize the structure of heating device. |
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| Keywords: | rapid thermal processing radiative heat transfer controlled by separate zones fuzzy PID |
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