Photocatalytic decomposition of NO on titanium oxide thin film photocatalysts prepared by an ionized cluster beam technique |
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| Authors: | Masato Takeuchi Hiromi Yamashita Masaya Matsuoka Masakazu Anpo Takashi Hirao Nobuhisa Itoh Nobuya Iwamoto |
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| Affiliation: | (1) Osaka Prefecture University, 1‐1 Gakuen‐cho, Sakai, Osaka 599‐8531, Japan;(2) Department of Electronic Engineering, Osaka University, Yamadaoka 1‐1, Suita, Osaka 565‐0871, Japan;(3) Human Environment Systems Development Center, Matsushita Electric Industrial Co., Ltd., Seika‐cho, Souraku, Kyoto 619‐0237, Japan;(4) Ion Engineering Research Institute Corporation, Tsuda, Hirakata, Osaka 573‐0128, Japan |
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| Abstract: | Transparent TiO2 thin film photocatalysts were prepared on transparent porous Vycor glass (PVG) by an ionized cluster beam (ICB) method. The
UV‐VIS absorption spectra of these films show specific interference fringes, indicating that uniform and transparent TiO2 thin films are formed. The results of XRD measurements indicate that these TiO2 thin films consist of both anatase and rutile structures. UV light (λ > 270 nm) irradiation of these TiO2 thin films in the presence of NO led to the photocatalytic decomposition of NO into N2, O2 and N2O. The reactivity of these TiO2 thin films for the photocatalytic decomposition of NO is strongly dependent on the film thickness, i.e., the thinner the
TiO2 thin films, the higher the reactivity.
This revised version was published online in July 2006 with corrections to the Cover Date. |
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| Keywords: | TiO2 thin film photocatalyst ionized cluster beam deposition method ion engineering technique decomposition reaction of NO |
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