铜合金表面Ti/TiN多层膜的制备、结构及其性能

为了研究多层膜的腐蚀性能，促进多层膜在生产中的应用，采用电弧离子镀技术，通过调整环境N₂和Ar气的时间比例在铜衬底上成功制备了不同调制周期的Ti/TiN多层膜.利用x 射线衍射谱和交流阻抗谱研究了该多层膜的结构和腐蚀性能.表面形貌显示，沉积的Ti/TiN多层膜具有明显的周期性，环境中N2和Ar气的时间比例决定了多层膜的调制周期，N₂气时间越长，多层膜中TiN相层越厚.腐蚀性能测定表明，多层膜的调制周期影响其耐蚀性，当调制周期为550nm时，沉积膜的耐腐蚀性最好.

Preparation,structure and performance of Ti/TiN multilayer film on surface of copper alloy

In order to study the corrosion resistance of multilayer films and promote their application in practical production,Ti/TiN multilayer films with various modulation periods were successfully prepared on copper substrate through adopting the arc ion plating technology and adjusting the time proportion of N2 and Ar gases.The sturcture and corrosion resistance of the proposed multilayer films were studied with x-ray diffraction spectra and alternating current(AC) impedance spectra.The observation on surface morphology shows that the deposited Ti/TiN multilayer films exhibit the apparent periodicity,and the modulation period of the multilayer films depends on the time proportion of N2 and Ar gases.The longer the aerating time of N2 gas is,the thicker the TiN layer in the multilayer films is.The experimental results of corrosion resistance indicate that the modulation period of the multilayer films will affect the corrosion resistance.When the modulation period is 550 nm,the corrosion resistance of the deposited multilayer film is the best.