| 激光光刻与相移掩模 |
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| 引用本文： | 路敦武. 激光光刻与相移掩模[J]. 微细加工技术, 1991, 0(2): 57-61 |
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| 作者姓名： | 路敦武 |
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| 作者单位： | 中国科学院上海光学精密机械研究所 201800 |
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| 摘 要： | 本文评述了激光光刻可能采取的方式及其待解决的问题,并对相移掩模技术作了概要的介绍。
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| 关 键 词： | 激光光刻 相移掩模 集成电路 |
LASER PHOTOLITHOGRAPHY AND PHASE--SHIFTING MASK |
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| Lu Dunwu. LASER PHOTOLITHOGRAPHY AND PHASE--SHIFTING MASK[J]. Microfabrication Technology, 1991, 0(2): 57-61 |
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| Authors: | Lu Dunwu |
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| Affiliation: | Shanghai Institute of Optics & Fine mechanics Academic Sinica |
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| Abstract: | This paper discusses some methods which Can be used in Laser photolithography and several problems which need to be solved.The phase-shifting mask technique is described briefly. |
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| Keywords: | Laser photolithography phase-shifting mask. |
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