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Selective oxidation of H2S in Claus tail-gas over SiC supported NiS2 catalyst
Authors:Marc J Ledoux  Cuong Pham-Huu  Nicolas Keller  Jean-B Nougayr  de  Sabine Savin-Poncet and Jacques Bousquet
Affiliation:

a Laboratoire de Chimie des Matériaux Catalytiques, GMI/ECPM/Université Louis Pasteur, 25, rue Becquerel, BP 08, 67087 Strasbourg Cedex 2, France

b Elf Aquitaine, Groupement de Recherche de Lacq, BP 34, 64170 Lacq, France

c Centre de Recherche Elf Solaize, Elf Antar France, BP 22, 69360 Solaize, France

Abstract:Very high activity and selectivity could be achieved for the direct oxidation of H2S into elemental sulfur at low reaction temperature (40–60°C), on nickel sulfide supported SiC catalyst. The heterogeneous nature of the support surface (hydrophilic and hydrophobic areas) could explain the important role played by water to maintain a high and stable H2S conversion level. The formation of a very active superficial nickel oxysulfide phase was proposed in order to explain the activation period necessary at reaction temperatures <60°C. Total selectivity for sulfur was attributed to the very low reaction temperature and the absence of any microporosity in the support.
Keywords:SiC supported catalyst  H2S  H2S abatement
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