Development of a microchannel catalytic reactor system

The purpose of this article is to demonstrate the applicability of microreactors for use in catalytic reactions at elevated temperatures. Microchannels were fabricated on both sides of a silicon wafer by wet chemical etching after pattern transfer using a negative photoresist. The walls of the reactor channel were coated with a platinum layer, for use as a sample catalyst, by sputtering. A heating element was installed in the channel on the opposite surface of the reactor channel. The reactor channel was sealed gas-tight with a glass plate by using an anodic bonding technique. A small-scale palladium membrane was also prepared on the surface of a 50-Μm thick copper film. In the membrane preparation, a negative photoresist was spin-coated and solidified to serve as a protective film. A palladium layer was then electrodeposited on the other uncovered surface. After the protective film was removed, the resist was again spin-coated on the copper surface, and a pattern of microslits was transferred by photolithography. After development, the microslits were electrolitically etched away, resulting in the formation of a palladium membrane as an assemblage of thin layers formed in the microslits. The integration of the microreactor and the membrane is currently under way.