Growth,characterization and electrical anisotropy in GaTe—a natural semiconducting superlattice |
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Authors: | S Pal D N Bose |
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Affiliation: | (1) Materials Science Centre, Indian Institute of Technology, 721 302 Kharagpur, India |
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Abstract: | GaTe is a III–VI semiconductor which has layered structure with large anisotropy in electrical properties. Growth of single crystals by the Bridgman technique permitted the measurement of thermoelectric power in orthogonal directions from which the anisotropy of hole effective masses were determined for the first time. From resistivity and Hall effect measurements the carrier activation energies and scattering mechanisms between 10–300°K were found. Study of the temperature dependence of conductivity revealed a variety of conduction mechanisms including weak localization below 20°K, hopping conduction between 20–50 K and band conduction in and across the layer planes atT>70 K. Weak localization was confirmed through observation of negative magnetoresistance. TheI–V characteristics showed quantized behaviour due to tunneling across potential barriers, which may be due to stacking faults between layer planes as observed by TEM studies. |
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Keywords: | GaTe III– VI semiconductor electrical anisotropy |
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