溅射沉积MoS2薄膜中掺杂Ti对其结构与性能的影响研究

采用非平衡磁控溅射沉积技术制备纯MoS2和不同Ti掺杂量的MoS2-Ti复合薄膜。用SEM和XRD对薄膜的形貌和结构进行分析,用纳米划痕仪测试薄膜与基底间的附着力,用球-盘摩擦试验机评价薄膜在大气和真空环境中的摩擦学性能。研究结果表明:在溅射沉积MoS2薄膜过程中掺杂金属Ti,有效地阻断了MoS2疏松、多孔柱状晶的优势生长,从而生成组织结构致密、无定形态的薄膜,提高了其与基底间的附着力。掺Ti复合薄膜在大气和真空环境中的摩擦学性能都得到显著改善,真空环境中10%Ti含量的薄膜耐磨寿命最长,是纯MoS2膜的37倍,大气环境中20%Ti含量的薄膜耐磨寿命最长,是纯MoS2膜的67倍。

Study of Structure and Mechanical Performance Changes Affected by Doping Ti in Sputtered MoS2 Coating

Pure MoS_2 and MoS_2-Ti composite coatings with different Ti contents were deposited by unbalanced magnetron sputtering system.SEM and XRD were used to analyse coating's structure,nanoscratch tester was used to measure adhesion force between coating and sample,ball-on-disc friction and wear tester was used to evaluate coating's tribological properties both in ambient and vacuum environment.The results show that doping Ti in MoS_2 coatings can block predominant growing of loose column structure,so coating becomes denser and reveals amorphous nature.With Ti content increasing,the critical load of coatings become higher.Compared with pure MoS_2 coating,doped Ti in films can improve its tribological properties remarkably,in vacuum the wear resistant lifetime of coating with 10%Ti is best,which is 37 fold of pure MoS_2 coating,in ambient environment,20%Ti coating appears best wear resistant property,which reaches 67 fold of pure MoS_2 coating.