Fabrication of high-purity silica glass through the WSPA-sol-gel process |
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Authors: | M Toki T Takeuchi S Miyasita S Kanbe |
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Affiliation: | (1) Research and Development Division, Seiko Epson Corporation, 3-3-5, Ouwa, Suwasi, Naganoken, Japan;(2) Present address: KRI International Inc., Kyoto Research Park, 17, Chudoji-Minamimachi, Shimogyo-ku, 600 Kyoto, Japan |
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Abstract: | High-purity and large-size silica glass was prepared by a wet process silica and pH adjustment (WSPA)-sol-gel process which involved the following steps: (1) colloidal silica synthesis through the hydrolysis reaction of TEOS catalysed by ammonia solution; (2) sol preparation through the hydrolysis reaction of TEOS by hydrochloric acid; (3) mixing the colloidal silica and sol solution; (4) adjusting the pH values of the mixed solution to 4–6; (5) gelling; (6) drying to a dry gel; (7) heat treatment of the gel to collapse the pores, finally to become a silica glass. The purity of the derived silica glass was examined in relation to the metallic impurities and -OH impurities. The relation between ultraviolet absorption of silica glass and metallic impurities was investigated. Ti addition to the silica glass gave a strong absorption at 200 m, for which the ultraviolet absorption coefficient, , was found to be 1.57×104 l mol–1 cm–1. The effects of the properties of colloidal silica on the -OH concentration and also the relations between the sintering conditions and residual -OH concentration in silica glass were examined. Using colloidal silica with a large particle size and heat treatment in vacuum resulted in a silica glass with a low concentration of residual -OH. |
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