| 直流反应磁控溅射在3003铝箔表面制备薄膜的研究 |
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| 引用本文： | 黄晓辉,左秀荣,王齐伟,史新伟,李广钦,刘凤芹.直流反应磁控溅射在3003铝箔表面制备薄膜的研究[J].真空,2009,46(4). |
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| 作者姓名： | 黄晓辉 左秀荣 王齐伟 史新伟 李广钦 刘凤芹 |
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| 作者单位： | 郑州大学材料物理教育部重点实验室,河南,郑州,450052 |
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| 基金项目： | 河南省科技攻关项目，河南省教育厅自然科学研究项目 |
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| 摘 要： | 为有效提高3003铝箔表面光泽度、比面积及强硬度,采用直流反应磁控溅射的方法.在一定溅射参数条件下,选用高纯钼靶和钛靶对3003铝箔进行溅射实验,分别在铝箔表面主要沉积出AlMo3、Al3Mo薄膜和TiAl、(Ti,Al)N薄膜,利用X射线衍射、扫描电镜分析相组成及微观组织结构,并测试了显微硬度和薄膜厚度,实验结果表明:制备出的AlMo3、Al3Mo薄膜和TiAl薄膜结晶良好,与基底结合良好,铝箔表面美观漂亮、硬度增高及比表面积得到一定提高.
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| 关 键 词： | 磁控溅射 薄膜 3003铝箔 |
On the thin films prepared on 3003 aluminum foil surface by DC reactive magnetron sputtering |
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| HUANG Xiao-hui,ZUO Xiu-rong,WANG Qi-wei,SHI Xing-wei,LI Guang-qin,LIU Feng-qin.On the thin films prepared on 3003 aluminum foil surface by DC reactive magnetron sputtering[J].Vacuum,2009,46(4). |
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| Authors: | HUANG Xiao-hui ZUO Xiu-rong WANG Qi-wei SHI Xing-wei LI Guang-qin LIU Feng-qin |
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| Abstract: | By DC reactive magnetron sputtering,the AlMo3,Al3Mo,TiAl and (Ti,Al)N thin films were successfully deposited on 3003 aluminum foil as substrate with some selected sputtering parameters to improve experimentally the surface lustrousness,specific surface area and hardness/strength.The surface morphology and structure of the thin films were analyzed by scanning electron microscopy (SEM) and X-ray diffraction (XRD) with relevent microhardness and thickness measured.The results showed that the AlMo3/Al3Mo and TiAl/(Ti,Al)N thin films deposited are all crystallized well and bonded firmly to Al-base alloy substrate,with smooth and lustrous appearance,high hardness and large specific surface area provided. |
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| Keywords: | AlMo3 Al3Mo TiAl (Ti Al)N magnetron sputtering thin film 3003 aluminum foil AlMo3 Al3Mo TiAl (Ti Al)N |
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