| 采用热丝CVD法在多种基材上沉积金刚石薄膜 |
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| 引用本文： | 苏革,黄荣芳.采用热丝CVD法在多种基材上沉积金刚石薄膜[J].表面技术,1998,27(1):5-7. |
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| 作者姓名： | 苏革 黄荣芳 |
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| 作者单位： | 中国科学院金属研究所
(苏革，黄荣芳，闻立时)，中国科学院金属研究所(成会明) |
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| 摘 要： | 热丝法是一种比较成熟的气相合成金刚石膜的方法，其其它方法比较，热丝法在工艺参数对金刚石薄膜的结构和质量的影响、界面的形成、薄膜生长各阶段的特征等方面的基础研究及各种应用研究上有其特征的优越性。本文采用热丝法在ＳｉＣ昌须增强Ｓｉ３Ｎ４陶瓷、ＡＩＮ陶瓷、Ｓｉ单晶片、Ｍｏ片等基材上沉积出金刚薄膜，并通过ＴＥＭ和ＳＥＭ进行观察，分析和研究了影响金刚石薄膜沉积的因素．
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| 关 键 词： | 热丝CVD法 沉积 金刚石薄膜 镀膜 |
Diamond Films Deposited on Various Substrates by Means of Hot Filament Vapor Deposition |
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| Su Ge et al.Diamond Films Deposited on Various Substrates by Means of Hot Filament Vapor Deposition[J].Surface Technology,1998,27(1):5-7. |
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| Authors: | Su Ge |
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| Affiliation: | Su Ge et al |
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| Abstract: | Diamond films have been deposited on various substrates by means of hot filament chemical vapor deposition (CVD). The characteristics of diamond films were observed and studied by means of TEM and SEM. |
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| Keywords: | Hot filament chemical vapor deposition Diamond film Substrate |
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