| 钨钴硬质合金电化学蚀刻加工研究 |
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| 引用本文： | 吉华,王伟,田间.钨钴硬质合金电化学蚀刻加工研究[J].表面技术,2002,31(5):32-33,36. |
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| 作者姓名： | 吉华 王伟 田间 |
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| 作者单位： | 四川大学化工机械系,四川,成都,610065 |
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| 摘 要： | 对YG6硬质合金电化学蚀刻工艺进行了研究,提出了采用光致抗蚀剂作保护膜,在生成一定钝化膜的情况下进行电化学蚀刻的方法.在一定的蚀刻深度范围内,该工艺的可控性好、腐蚀区表面质量较好.
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| 关 键 词： | 电化学蚀刻 光致抗蚀剂 钨钴硬质合金 |
| 文章编号： | 1001-3660(2002)05-0032-02 |
Study on the Optical Electrochemical Maching of WC Alloy |
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| JI Hua,WANG Wei,TIAN Jian.Study on the Optical Electrochemical Maching of WC Alloy[J].Surface Technology,2002,31(5):32-33,36. |
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| Authors: | JI Hua WANG Wei TIAN Jian |
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| Abstract: | In this article optical electrochemical maching of WC alloy is studied,the techniques of electrochemical maching with some passivation film are presented using photoresist as protecting film.With a certain range of deepness, control performance of the technics and roughness of etched surface is satisfactory. |
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| Keywords: | Electrochemical machining Photoresist WC alloy |
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