往复扫描喷射沉积过程中雾化器运动的研究

雾化器运动是雾化器往复扫描喷射沉积过程中一个非常重要的因素。研究了雾化器往复扫描喷射沉积过程中雾化器的运动，总结了不同的喷射距离下，雾化器喷射密度函数的分布以及雾化器在扫描过程中运动速度v与沉积锭坯半径R之间的关系。在雾化器往复扫描喷射沉积过程中，根据对雾化器运动的研究进行数值模拟，实现了喷射沉积过程的工艺优化，为进一步研究喷射沉积过程提供了理论依据，对于工业生产也具有指导意义。

Study about Movement of Atomizer in Spray Deposition with Scanning Atomizer to and fro

Movement of atomizer is a very important process parameter in spray deposition with scanning atomizer to and fro.Based on analysis of movement of atomizer in spray deposition with scanning atomizer to and for,the mass distribution function at different spray distances and the relationship between scanning velocity of atomizer(v) and radius(R) of billet were made.The shape and size of billets could be predicted successfully in terms of many process parameters analyzed.e.g.movement of scanning atomizer,track of jet flow etc.Process optimization on the process of spray deposition can be obtained through research about movement of scanning atomizer and process parameters.The conclusions were made and instructional to the industry product and further study of spray deposition.