| 直流磁控溅射功率对ITO薄膜光学性能的影响 |
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| 引用本文： | 江建勇,耿志挺,郑艺欣.直流磁控溅射功率对ITO薄膜光学性能的影响[J].中国材料科技与设备,2014(3):4-6. |
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| 作者姓名： | 江建勇 耿志挺 郑艺欣 |
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| 作者单位： | 清华大学材料学院,北京100084 |
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| 摘 要： | 本实验的ITO薄膜样品是利用直流磁控溅射技术在玻璃基片上沉积而成的。通过改变溅射功率，研究不同溅射功率对ITO薄膜光学性能的影响。经各实验测试后发现：在实验给定的功率区间内，ITO薄膜的厚度随着溅射功率的增加而增加，其可见光透过率则随之降低。
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| 关 键 词： | ITO薄膜 直流磁控溅射 光学}生能 |
The Effects of DC Magnetron Sputtering Power on Optical Properties of ITO Thin Films |
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| Affiliation: | JIANG Jian-yong, GENG Zhi -ting , ZHENG Yi -xin (School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China) |
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| Abstract: | The experiment of ITO thin film samples were deposited on glass substrates by DC reactive magnetron sputtering. The effects of sputtering power on optical properties of ITO thin films were investigated. The results of several tests show that within the scope of the set of power, the increase of sputtering＇power leads to the increase of the thickness of the films, while the decrease of the visible light transmittance of ITO thin films. |
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| Keywords: | ITO thin films DC Reactive Magnetron Sputtering Optical Properties |
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