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TiNi形状记忆合金薄膜的表面形貌及影响
引用本文:邱平善,李丹,郭立伟. TiNi形状记忆合金薄膜的表面形貌及影响[J]. 哈尔滨理工大学学报, 2000, 5(1): 103-106
作者姓名:邱平善  李丹  郭立伟
作者单位: 
基金项目:国家自然科学基金!59571018
摘    要:研究了TiNi形状记忆合金薄膜的表面形貌及其影响因素、试验结果证明:该薄膜的形成过程遵循形核、长大、迷津结构和连续膜4个阶段,镀时氩分压、基板温度、基板类型、基板的表面粗糙度以及膜的成分、镀后热处理等对薄膜的形貌有重大的影响。

关 键 词:形状记忆合金 薄膜 表面形貌 TiNi薄膜

The Morphology of TiNi SMA Thin Film and its Influencing Factors
QIU Ping-shan,LI Dan,GUO Li-wei,HUANG Wei-xin, WANG Gui-song,YU Wei-dong. The Morphology of TiNi SMA Thin Film and its Influencing Factors[J]. Journal of Harbin University of Science and Technology, 2000, 5(1): 103-106
Authors:QIU Ping-shan  LI Dan  GUO Li-wei  HUANG Wei-xin   WANG Gui-song  YU Wei-dong
Abstract:The morphology of TiNi SMA thin film and its influencing factors are researched. It shows that the form of TiNi SMA thin film follows four-period process:forming nucleus, growing up, forming astray-structure and continuous film. There are many factors influencing the morphology of TiNi SMA thin film, which are Argon pressure, substrate temperature, substrate type and roughness of its surface under the regular arc discharge, and composition of the film as well as heat treatment after deposit of the film.
Keywords:shape memory alloy   morphology of thin film   influencing factor
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